DarkStructureEnhance will not run with masked image RC7

[kwalker]

Trying to isolate structures using a mask over the background gives me an error that the image is already being processed.
always repeatable.
previous releases allowed masking.

[kwalker]

this is a screen shot of the error

[cclark]

I just tried the same action and was able to reproduce the error.  Running RC7 on OSX 10.7.5.

[Alejandro Tombolini]

Hi, I believe that it is not a bug. In previous versions, DSE could have been done while a mask was applied, however that mask was not taken into consideration as the process builds its own.
Disable the mask and the script will work fine.
Anyhow a warning would sound better than an error. 
Saludos.
Alejandro.

[kwalker]

The script does work fine without the mask applied but its a blanket process .
it was nice to be able to selective enhance target areas.
At this time the script will not complete the task ,it just fails.
I like your suggestion of a warning ,but let the script complete.
maybe there's way to do this with PixelMath.

[Alejandro Tombolini]

Hi,
You can see here that there is an explanation of how the script works.
Saludos. Alejandro.

[kwalker]

Thank you Alejandro.

[kwalker]

Just for reference I was using DSE masked to get into the dust lanes of some targets ,which worked for me.
I got spoiled.
I'm sure there is an alternative to my approach and I'll figure that out in PM or start a new thread if I need help.
DSE is quite functional in its present form for other tasks (as designed).

[pfile]

well, i suppose you could do the DSE on a clone of the image and then blend the DSE image into the original one while masking your image with the mask you wanted to use...

[kwalker]

I never thought of that

[Juan Conejero]

previous releases allowed masking.

Scripts cannot be masked, neither in PI 1.8 nor in previous versions. ATrousWaveletTransform is the right tool to isolate image structures.

[kwalker]

thanks Juan.
I was trying to cheat
ATrousWaveletTransform works great ,I'll just have to be more patent.